面具合成

面具合成

前沿光刻解决方案

掩模合成是由用于开发和批量使用模型的光刻工具。变形杆菌批处理工具提供用于执行全芯片光学邻近校正(OPC),逆光刻技术(ILT),并且在校正后的IC布局图案过程检查和分析的全面和强大的环境。

For development use models, Proteus and Sentaurus Lithography have been tightly integrated to provide the upmost accuracy and predictability to delivery faster time-to-market results.Synopsys’ Mask Synthesis tools have been industry tested for almost two decades and are the tool of choice for leading-edge IDM’s and foundries.